| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic equipment and a lithographic method which can reduce generation of bubbles in liquid. <P>SOLUTION: The lithographic equipment comprises a substrate table for holding a substrate, a projection system which is arranged to project a radiation beam patterned on the substrate, a liquid supplying system prepared to supply liquid to a space between the projection system, the substrate and the substrate table, and a ring placed to cover a gap between the substrate and the substrate table and made contact with both of them. <P>COPYRIGHT: (C)2008,JPO&INPIT |
