发明名称 SAMPLE INSPECTION DEVICE, SAMPLE INSPECTION METHOD, AND SAMPLE INSPECTION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a sample inspection device capable of giving stimulus to a sample retained on a film, a sample inspection method and a sample inspection system, when charged particle beams such as electron beams are irradiated onto a sample retained on the film through the film as primary beams, and sample inspection is carried out by the above. SOLUTION: The sample inspection device is provided with a primary-beam irradiation means 1 irradiating primary beams 7 on a sample 20 through a film 32, and a signal detection means 4 detecting a secondary signal produced from the sample 20 in response to the irradiation of the primary beams 7. And also, it includes a manipulator 26 equipped with a tip part capable of approaching or contacting the sample 20, an optical image acquiring means 27 for acquiring an optical image of the sample 20, and a control means 28 for controlling each operation of the primary irradiation means 1, the signal detection means 4, the manipulator 26 and the optical image acquiring means 27. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008153086(A) 申请公布日期 2008.07.03
申请号 JP20060340682 申请日期 2006.12.19
申请人 JEOL LTD 发明人 NISHIYAMA HIDETOSHI
分类号 H01J37/28;G01N23/225;H01J37/18;H01J37/20 主分类号 H01J37/28
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