发明名称 MASK AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a mask, in which a supporting substrate on which chips are fixed can be preferably recovered and re-utilized, and its manufacturing method. SOLUTION: In the mask 10 having the supporting substrate 30 holding a plurality of chips 20, alignment marks 33 and 34 are formed by irradiating a position on the way in the thickness direction of the supporting substrate 30 consisting of a sheet glass to modify the glass. Therefore, when any of the plurality of chips 20 is found to be defective and the chips 20 are removed to recover the supporting substrate 30, the mask 10 can be manufactured again by using the recovered supporting substrate 30, since the alignment marks 33 and 34 do not disappear. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008150691(A) 申请公布日期 2008.07.03
申请号 JP20060342300 申请日期 2006.12.20
申请人 SEIKO EPSON CORP 发明人 SHINTO SUSUMU
分类号 C23C14/04 主分类号 C23C14/04
代理机构 代理人
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