| 摘要 |
A method for inspecting a semiconductor device is provided to easily and precisely perform an inspection process by eliminating the necessity that an element value of the same level should be used in a specific measurement element in one chip region. An inspection element of a first level is used to perform an inspection process in a first region of one chip region(20) in a wafer. An element value of a second level is used to perform an inspection process in a second region except the first region. The chip can be a non-memory semiconductor device, and the first region can be a circuit region(321,323) in the chip while the second region can be a cell region(345).
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