| 摘要 |
A dry apparatus for photoresist of large sized substrate is provided to configure and keep a vacuum state easily by preventing circulation of air in the lower part of a chamber into the upper part thereof. A pedestal(20) is installed between the upper part and the lower part of a chamber. A support pin(21) is installed above the pedestal, and a large sized substrate settles thereon. A plurality of pin holes(22) are formed on the pedestal. A lift pin(30) is able to be moved vertically through the pin holes, and settles the substrate on the support pins by transferring the substrate, and closes the pin holes when the large sized substrate is settled on the plural support pins.
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