<p>System aberrations are effected in a projection system of a lithographic apparatus to optimize imaging of a thick reflective mask with a thick absorber that is obliquely illuminated. The aberrations may include Z5 astigmatism, Z9 spherical, and Z12 astigmatism. <IMAGE></p>
申请公布号
EP1434099(B1)
申请公布日期
2008.07.02
申请号
EP20030257415
申请日期
2003.11.25
申请人
ASML NETHERLANDS B.V.
发明人
LOWISCH, MARTIN;DIERICHS, MARCEL MATHIJS THEODORE MARIE;VAN INGEN SCHENAU, KOEN;VAN DER LAAN, HANS;LEENDERS, MARTINUS HENDRIKUS ANTONIUS;MCGOO, ELAINE;MICKAN, UWE
