发明名称 Method of manufacturing thin film device electro-optic device, and electronic instrument
摘要 A method of manufacturing a thin film device includes forming a pair of multi-layered structures by bonding a transfer layer including a thin film device to a temporary transfer substrate, respectively adhering the transfer layers of a pair of the multi-layered structures to both surfaces of a transfer-target substrate; and separating the temporary transfer substrate from each of the transfer layers adhered to the transfer-target substrate. The bonding step includes forming the transfer layer on a transfer-source substrate via a first separation layer separated in accordance with application of a predetermined amount of energy, bonding the transfer layer to the temporary transfer substrate, and separating the transfer-source substrate from the transfer layer by applying energy to the first separation layer to cause a boundary separation and/or an intra-layer separation in the first separation layer.
申请公布号 US7393725(B2) 申请公布日期 2008.07.01
申请号 US20050220842 申请日期 2005.09.08
申请人 SEIKO EPSON CORPORATION 发明人 KODAIRA TAIMEI
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址