| 摘要 |
A wet cleaning apparatus for a semiconductor wafer is provided to prevent damage of a megasonic reservoir and a megasonic oscillation unit by using a guide frame for guiding a chemical overflown from a chemical reservoir. A megasonic oscillation unit(60) generates megasonic, and a megasonic reservoir(50) is positioned over the megasonic oscillation unit to propagate the vibration resulted from the megasonic. A chemical(10) filed in a chemical reservoir(30) is vibrated by the vibration propagated from the megasonic reservoir, to clean a semiconductor wafer(20) dipped in the chemical. The chemical overflown from the chemical reservoir is guided by a guide frame(40) to prevent the overflown chemical from flowing in the megasonic reservoir and the megasonic oscillation unit.
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