发明名称 |
SUBSTRATE SUPPORT AND LITHOGRAPHIC PROCESS |
摘要 |
<p>Substrate support and lithographic process A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part, the peripheral part comprising an extraction duct configured to extract a liquid from a top surface of the substrate support, the extraction duct connected to an exit duct configured to duct the liquid away from the substrate support. The substrate support further includes a thermal decoupler, arranged in the peripheral part, configured to arranged to decrease heat transport between the central part and the peripheral part.</p> |
申请公布号 |
SG143241(A1) |
申请公布日期 |
2008.06.27 |
申请号 |
SG20070184781 |
申请日期 |
2007.12.10 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HENNUS PIETER, RENAAT, MARIA;FRITS VAN DER MEULEN;OTTENS JOOST, JEROEN;STEIJAERT PETER, PAUL;STEIJNS HUBERT, MATTHIEU, RICHARD;PETER SMITS |
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