| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition for liquid immersion exposure that can form a resist film having a high surface hydrophobicity and excelling in lithography performance, and a method of forming a resist pattern. <P>SOLUTION: The positive resist composition for liquid immersion exposure comprises (A) resin component whose alkali solubility is increased by the action of an acid; (B) acid generator component capable of generating an acid when exposed to light; and (C) resin component containing a fluorine atom but not having any acid dissociative group, wherein the resin component (A) contains (A1) resin having (a) constituent unit derived from acrylic acid but not containing a fluorine atom, and wherein the resin component (C) contains (C1) noncircular-principal chain resin and (C2) circular-principal-chain resin. The method of forming a resist pattern includes a step of forming a resist film on a support using the resist composition; a step of subjecting the resist film to liquid immersion exposure; and a step of forming a resist pattern by developing the resist film. <P>COPYRIGHT: (C)2008,JPO&INPIT |
