发明名称 RESISTANCE CHANGE ELEMENT AND METHOD FOR MANUFACTURING THE SAME
摘要 [PROBLEMS] To provide a resistance change element, which can render the amount of current flown per cell smaller than that in the prior art technique, and a method for manufacturing the same. [MEANS FOR SOLVING PROBLEMS] A resistance change memory (ReRAM) for storing data by taking advantage of a change in resistance of a resistance change element (70), wherein the resistance change memory comprises a lower electrode (a ground-side electrode) (67a) of the resistance change element (70) formed of a transition metal such as Ni, and an upper electrode (a positive electrode-side electrode) (69a) formed of a noble metal such as Pt. A transition metal oxide film (68a) is provided between the lower electrode (67a) and the upper electrode (69a). The transition metal oxide film (68a) is, for example, an oxide film of a transition metal of the same type as the transition metal constituting the lower electrode (67a) (NiOx film).
申请公布号 WO2008075471(A1) 申请公布日期 2008.06.26
申请号 WO2007JP60451 申请日期 2007.05.22
申请人 FUJITSU LIMITED;NOSHIRO, HIDEYUKI 发明人 NOSHIRO, HIDEYUKI
分类号 H01L27/10 主分类号 H01L27/10
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