| 发明名称 |
MULTIPLE-USE PROJECTION SYSTEM |
| 摘要 |
Projection exposure methods and systems for exposing substrates are disclosed. The methods and systems feature projection objectives capable of multiple exposure configurations having different image side numerical apertures and different image field sizes.
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| 申请公布号 |
US2008151211(A1) |
申请公布日期 |
2008.06.26 |
| 申请号 |
US20070951746 |
申请日期 |
2007.12.06 |
| 申请人 |
CARL ZEISS SMT AG |
发明人 |
KAISER WINFRIED;ULRICH WILHELM;FELDMANN HEIKO;DODOC AURELIAN |
| 分类号 |
G03B27/72 |
主分类号 |
G03B27/72 |
| 代理机构 |
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