发明名称 PHOTOSENSITIVE ELEMENT
摘要 <p>An photosensitive element comprising: a substrate film (10) which has a haze of 1.0% or less and has a surface resistance of 10&lt;SUP&gt;13&lt;/SUP&gt; O or less on its second main surface (14) opposed to a first main surface (12) thereof; and a layer (20) which comprises a photosensitive resin composition and contains a binder polymer comprising a compound represented by the general formula (I) and (meth)acrylic acid as monomer units, a photopolymerizable compound, and a photopolymerization initiator. H&lt;SUB&gt;2&lt;/SUB&gt;C=CR&lt;SUP&gt;1&lt;/SUP&gt;-COOR&lt;SUP&gt;2&lt;/SUP&gt; (I) wherein R&lt;SUP&gt;1&lt;/SUP&gt; represents a hydrogen atom or a methyl group; and R&lt;SUP&gt;2&lt;/SUP&gt; represents an alkyl group having 3 to 7 carbon atoms.</p>
申请公布号 WO2008075575(A1) 申请公布日期 2008.06.26
申请号 WO2007JP73702 申请日期 2007.12.07
申请人 HITACHI CHEMICAL COMPANY, LTD.;KUBOTA, MASAO 发明人 KUBOTA, MASAO
分类号 G03F7/004;G03F7/033;H05K3/00 主分类号 G03F7/004
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