发明名称 Nanoelectronic structure and method of producing such
摘要 The present invention relates to semiconductor devices comprising semiconductor nanoelements. In particular the invention relates to devices having a volume element having a larger diameter than the nanoelement arranged in epitaxial connection to the nanoelement. The volume element is being doped in order to provide a high charge carrier injection into the nanoelement and a low access resistance in an electrical connection. The nanoelement may be upstanding from a semiconductor substrate. A concentric layer of low resistivity material forms on the volume element forms a contact.
申请公布号 US2008149914(A1) 申请公布日期 2008.06.26
申请号 US20070812226 申请日期 2007.06.15
申请人 QUNANO AB 发明人 SAMUELSON LARS IVAR;SVENSSON PATRIK;OHLSSON JONAS;LOWGREN TRULS
分类号 H01L21/20;H01L29/06 主分类号 H01L21/20
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