发明名称 PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a high-sensitivity photosensitive composition suitable for use in direct writing with light from a UV lamp and to provide a dry film obtained by applying the composition onto a carrier film and then drying it. <P>SOLUTION: The photosensitive composition is used in direct writing with light from a UV lamp to form a patterned latent image to be developed with an alkaline aqueous solution, wherein a dry coating thereof before light exposure shows an absorbance of 0.6-1.2 in a wavelength range of 355-375 nm and an absorbance of 0.3-0.6 at a wavelength of 405 nm, per 25 &mu;m film thickness of the dry coating. The dry film is obtained by applying the composition onto a carrier film and then drying it. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008146044(A) 申请公布日期 2008.06.26
申请号 JP20070297036 申请日期 2007.11.15
申请人 TAIYO INK MFG LTD 发明人 SHIBAZAKI YOKO;KATO KENJI;ARIMA MASAO
分类号 G03F7/027;G03F7/004;G03F7/029;G03F7/031;H05K3/28 主分类号 G03F7/027
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