PELLICLE REMOVE APPARATUS FOR PHOTO MASK AND METHOD THEREFOR

摘要

A pellicle removing apparatus for a photo mask and a method therefor are provided to reduce the cost required for reinstalling a pellicle by optimizing a process after the pellicle is removed. A shield layer(3) is deposited on the whole surface of an upper portion of a transparent substrate(1). A photoresist is applied to the upper portion of the shield layer. Exposure and development processes are performed to pattern the photoresist so that a part of the shield layer is exposed. The exposed shield layer is etched to pattern the shield layer on an upper portion of the transparent substrate. The patterned photoresist is removed. A pellicle frame(7) is installed on the upper portion of the transparent substrate. A thermoplastic adhesive agent layer(9) is disposed on an upper surface of the pellicle frame to form a pellicle(11). A thickness of the transparent substrate is 2 to 7 mm.