| 摘要 |
The invention relates to a vacuum plasma generator for providing a plasma discharge ( 10 ) for treating work pieces ( 5 ) by way of a pulsed plasma process in a vacuum chamber ( 2 ). Said vacuum plasma generator comprises a generator output ( 9, 9 ') having an AC mains supply ( 6 a), an AC/DC mains rectifier system ( 6 ) for rectifying the AC mains voltage to a DC voltage, a filter capacitor ( 6 b), a first stage as clocked DC/DC voltage converter ( 7 ) with means for adjusting the DC output voltage which produces an intermediate circuit voltage (Uz), comprising a controlled power switch ( 7 a) which feeds the primary winding of a transformer ( 14 ) and the secondary winding of which is connected to a rectifier ( 15 ) and a downstream intermediate capacitor ( 12 ) and configures a floating transformer secondary circuit ( 23 ). Said secondary circuit is connected to a downstream second stage which is a pulse output stage ( 8 ) and is connected to the generator output ( 9, 9 '). The DC/DC voltage converter ( 7 ) has at least two floating transformer secondary circuits ( 23 ) and comprises a switch-over device ( 20 ) with a switch controller ( 22 ) for optionally switching the floating transformer secondary circuits ( 23 ) in parallel or in series.
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