| 摘要 |
An adaptive plasma source is provided to improve uniformity of an etch rate by convexly arranging coils constituting an adaptive plasma source. A bushing(210) is disposed in the center of an adaptive plasma source. A plurality of coils(201,202,203,204) are spirally disposed along the circumference of the bushing, ramified from the lateral surface of the bushing. The plurality of coils are arranged in a manner that the vertical distance between the bottom surface of the bushing and its parallel horizon becomes longer as it goes away from the bushing. The bushing can have a convex shape facing downward as it goes from the center of the bushing to the edge of the bushing.
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