| 摘要 |
An improved method for nanoimprint lithography and more specifically for providing a nano-scale pattern on a substrate is disclosed. According to the improvement, a mould ( 100 ) and a substrate ( 115 ) are provided wherein the substrate ( 115 ) is provided with a plurality of coating layers ( 120, 125, 130 ) before pressing the mould ( 100 ) and substrate ( 115 ) together for transferring a pattern from the mould ( 100 ) to the substrate ( 115 ). According to the invention, the substrate is provided with an uppermost layer ( 130 ) having a pure anti-adhesive function.
|
