| 发明名称 |
Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle |
| 摘要 |
A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.
|
| 申请公布号 |
US2008137049(A1) |
申请公布日期 |
2008.06.12 |
| 申请号 |
US20080068287 |
申请日期 |
2008.02.05 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JASPER JOHANNES CHRISTIAAN MARIA;BAGGEN MARCEL KOENRAAD MARIE;BRULS RICHARD JOSEPH;CICILIA ORLANDO SERAPIO;VAN DIJCK HENDRIKUS ALPHONSUS LUDOVICUS;HOFMANS GERARDUS CAROLUS JOHANNUS;JANSEN ALBERT JOHANNES MARIA;LUIJTEN CARLO CORNELIS MARIA;PONGERS WILLEM RICHARD;WEHRENS MARTIJN GERARD DOMINIQUE;UITTERDIJK TAMMO;BOOM HERMAN;DEMARTEAU MARCEL JOHANNES LOUIS MARIE |
| 分类号 |
G03B27/42;G03F1/14;G03B27/68;G03F1/62;G03F1/64;G03F1/82;G03F7/20;H01L21/027 |
主分类号 |
G03B27/42 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
