A LAYOUT METHOD FOR MASK AND A SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

摘要

A layout method for a mask and a semiconductor device and a method for manufacturing the same are provided to improve pattern uniformity between a main pattern region and a dummy pattern region by inserting a micro-lens dummy pattern. A micro-lens main pattern is formed on a substrate. A micro-lens dummy pattern(102) is formed on one side of the micro-lens main pattern. A color filter dummy pattern(101) is formed at a lower side of the micro-lens dummy pattern. The micro-lens dummy pattern is an octagon shape. A layout method for a mask includes a process for forming the micro-lens main pattern on the substrate and a process for forming the micro-lens dummy pattern on one side of the micro-lens main pattern.