发明名称 CMOS imager with enhanced transfer of charge and low voltage operation and method of formation
摘要 A dopant gradient region of a first conductivity type and a corresponding channel impurity gradient below a transfer gate and adjacent a charge collection region of a CMOS imager photodiode are disclosed. The channel impurity gradient in the transfer gate provides a complete charge transfer between the charge collection region of the photodiode and a floating diffusion node. The dopant gradient region is formed by doping a region at one end of the channel with a low enhancement dopant and another region at the other end of the channel with a high enhancement dopant.
申请公布号 US7385232(B2) 申请公布日期 2008.06.10
申请号 US20050158045 申请日期 2005.06.22
申请人 MICRON TECHNOLOGY, INC. 发明人 PATRICK INNA
分类号 H01L31/072;H01L21/331;H01L27/146;H01L29/04;H01L31/062 主分类号 H01L31/072
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