发明名称 EXPOSURE APPARATUS, CONTROL METHOD FOR THE SAME, AND DEVICE MANUFACTURING METHOD
摘要 <p>An exposing apparatus, a method for controlling the same, and a method for manufacturing a device are provided to effectively exchange a reticle by using two magnets. A table(3) for mounting a reticle(5) is configured to move in a first direction over a base guide. A repulsive power generator includes a first magnet(9) installed on the end of the table in the first direction and a second magnet(8) movably installed on the end of the base guide in the first direction. The repulsive power generator applies repulsive power to the table, the repulsive power being generated by the first and second magnets at the end of a movable stroke of the table in the first table. A driving unit is configured to reciprocally drive the table in the first direction in case the repulsive power generator applies the repulsive power to the table. A controller is configured to with draw the second magnet to a position where the repulsive power does not affect to the table when the table is moved to an exchange work position to exchange the reticle.</p>
申请公布号 KR20080051058(A) 申请公布日期 2008.06.10
申请号 KR20070120670 申请日期 2007.11.26
申请人 CANON KABUSHIKI KAISHA 发明人 NISHIMURA MITSUO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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