发明名称 Sacrificial film-forming composition, patterning process, sacrificial film and removal method
摘要 A sacrificial film-forming composition is provided comprising (A) an organofunctional silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formula (1) and formula (2) and/or (3): <?in-line-formulae description="In-line Formulae" end="lead"?>X-Y-SiZ<SUB>3</SUB> (1)<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>R<SUB>n</SUB>SiZ<SUB>4-n</SUB> (2)<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>P-SiZ<SUB>3</SUB> (3)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein Z is a hydrolyzable group, X is a crosslinkable organofunctional group, Y is a single bond or a divalent hydrocarbon group, R is hydrogen or a monovalent hydrocarbon group, n is an integer of 0-3, and P is a substituent group which readily decomposes and volatilizes upon thermal decomposition, (B) a crosslinking agent, (C) an acid generator, (D) an extender or porogen, and (E) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is effectively dissolvable in a stripping solution.
申请公布号 US7385021(B2) 申请公布日期 2008.06.10
申请号 US20050148161 申请日期 2005.06.09
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 HAMADA YOSHITAKA;OGIHARA TSUTOMU;IWABUCHI MOTOAKI;ASANO TAKESHI;UEDA TAKAFUMI
分类号 C08G77/08;G03F7/11;C08G77/00;C08G77/14 主分类号 C08G77/08
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