Method for processing coating film and method for manufacturing semiconductor element with use of the same method,申请号KR20020023603-传众专利搜索

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发明名称	Method for processing coating film and method for manufacturing semiconductor element with use of the same method
摘要
申请公布号	KR100835659(B1)	申请公布日期	2008.06.09
申请号	KR20020023603	申请日期	2002.04.30
申请人		发明人
分类号	H01L21/302;H01L21/311;H01L21/3065;H01L21/316;H01L21/768;H01L23/522	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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