| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask holding device and a mask attaching/detaching method having excellent practicality in such a manner that the attaching/detaching of a mask can be performed without damaging an element in the surface of a substrate, film deposition of a more precise element pattern is made possible, and a magnet part can be utilized independently of a treatment chamber. SOLUTION: Regarding the mask holding device adsorbing and holding a mask 2 to the surface side of the substrate 1 to be subjected to film deposition treatment by a magnet part 3, the magnet part 3 is provided to the back surface of the substrate 1 freely attachably/detachably, and is abutted or made close to the back surface of the substrate 1; thus the mask 2 is magnetically attracted and held to the surface side of the substrate 1. A magnetic flux derivative 4 for reducing the attracting holding power of the mask 2 by the magnet part 3 by being abutted to or made close to the magnet part 3 is provided freely attachably/detachably to the magnet part 3. COPYRIGHT: (C)2008,JPO&INPIT
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