| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a WV-based target material used for forming a thin film for an electronic component such as a substrate film mainly in a magnetic recording medium. SOLUTION: Provided is a method for producing a WV-based target material composed of, by atom, 5 to 50% V, and the balance W, wherein, using V powder with the average particle diameter of≤150μm and W powder with the average particle diameter of 10 to 50μm as raw material powder, solidified molding is performed at 1,250 to 1,400°C. Also provided is a method for producing a WV-based target material in which the average particle diameter of the V powder as the raw material powder is controlled to 20 to 150μm. COPYRIGHT: (C)2008,JPO&INPIT
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