| 摘要 |
According to an exposure apparatus and an exposure method in the present invention, based on a focus value and a leveling value in each exposure shot calculated based on measurements by a focus sensor, differential absolute values for respective values are calculated. The differential absolute values for the focus value and leveling value are compared with predetermined threshold value for the respective differential absolute values. When the differential absolute values exceed the threshold value, it is determined that an exposure abnormality exists. In such case, based on at least the number of exposure area where the exposure abnormality is occurred and distribution of the exposure area where the exposure abnormality is occurred on the object to be exposed, a kind of the exposure abnormality is identified. The detection of the exposure abnormality is assured, and a cause of the abnormality is determined without lowering manufacturing capabilities and increasing in costs. |
