| 摘要 |
Etching/strip equipment and its method are provided to prevent a process defect due to contamination of a rear of a substrate by a photoresist, and to prevent the breakage of the substrate due to the disorder thereof. An in-conveyor(121) includes a transfer unit moving over a roller of a roller conveyor. A substrate is mounted on the transfer unit of the in-conveyor. A first tilt unit(122) fixes the substrate on the transfer unit being transferred from the in-conveyor and tilts the transfer unit in a preset angle. A chemical treatment unit treats with chemicals the substrate of the tilted transfer unit transferred from the first tilt unit. A second tilt unit(125) returns the tilted transfer unit to a horizontal state. An out-conveyor(126) unloads the substrate on the returned transfer unit transferred from the second tilt unit. The transfer unit is comprised of a plate rolling over the roller of the roller conveyor, a receiving section formed on the plate for receiving a glass substrate, and a fixing part provided on both sides of the plate for preventing the flowage of the glass substrate.
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