发明名称 SURFACE TREATMENT METHOD AND SURFACE TREATMENT APPARATUS, EXPOSURE METHOD AND EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a surface treatment method capable of preventing a liquid from remaining on the surface of an article. SOLUTION: The surface treatment method includes an operation for giving an energy to an article in a state where the surface of the article contacts a predetermined liquid, to reduce the surface energy of the article having liquid repellency. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008130597(A) 申请公布日期 2008.06.05
申请号 JP20060310278 申请日期 2006.11.16
申请人 NIKON CORP 发明人 TANI HIROHISA
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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