发明名称 BOAT FOR VERTICAL HEAT TREATMENT, AND HEAT TREATMENT METHOD OF SEMICONDUCTOR WAFER USING SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an inexpensive boat for vertical heat treatment that can be improved easily by preventing slippage from occurring due to the inclination of each support section, when heat-treating a substrate to be treated by a vertical heat-treatment oven. <P>SOLUTION: In the boat for vertical heat-treatment, at least a plurality of posts and a pair of plate members connected to both the edges of each post are provided, a plurality of support sections for supporting the substrate to be treated horizontally are formed at each post, and a support auxiliary member where the substrate to be treated is placed one by one is attached to the plurality of support sections detachably. In the boat for vertical heat-treatment, a surface attached to the support section is machined to the shape of each support section in the support auxiliary member, or a spacer is interposed between the support section and the support auxiliary member, thus adjusting the inclination of a surface where the substrate to be treated is placed for each support section. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008130838(A) 申请公布日期 2008.06.05
申请号 JP20060314578 申请日期 2006.11.21
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 KOBAYASHI TAKESHI
分类号 H01L21/324;H01L21/22;H01L21/31;H01L21/673 主分类号 H01L21/324
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