| 摘要 |
A template, stamp or mold is fabricated by using a low-k material. The structure of the low-k material is transformed when it is baked in a novel heating process. Thus, the template is fabricated to obtain a high hardness and a high aspect-ratio with a low dose of electron beam lithography and an optimized baking process. Consequently, the residual; layer at photoresist bottom is reduced and the time for reactive ion etching is saved. In the end, the stability and the integrity is improved. Hence, the present invention is a solution for fabricating a template, stamp or mold with the feature size from sub-micrometer down to nanometer level.
|
