| 摘要 |
A monomer for forming an organic anti-reflective coating layer, a polymer thereof and a composition including the same are disclosed. In a photolithography process, the organic anti-reflective coating layer absorbs an exposed light between a layer to be etched and a photoresist layer, and prevents a photoresist pattern from collapsing due to a standing wave generated under the photoresist layer. The polymer for forming an organic anti-reflective coating layer includes a repeating unit represented by Formula wherein, R<SUB>1 </SUB>is a hydrogen atom, a methyl group or an ethyl group, R<SUB>2 </SUB>is a C<SUB>1</SUB>~C<SUB>20 </SUB>alkylene group, a C<SUB>3</SUB>~C<SUB>20 </SUB>cycloalkylene group or a C<SUB>6</SUB>~C<SUB>20 </SUB>aromatic hydrocarbon group, POSS is a polyhedral-oligomeric-silsesquioxane, and m is an integer of 2 to 110.
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