| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern drawing apparatus that can prevent the contamination of an aperture, by which replacement work of the aperture to be mounted onto a plurality of optical heads is automated to efficiently exchange the aperture. <P>SOLUTION: The pattern drawing apparatus 1 mainly performs an exchange processing for the aperture AP mounted to each of the optical heads 32a, 32b, ..., 32g by operating an aperture exchange section 40 and an aperture unit 36 on the basis of instructions from a control unit 50. Specifically, a hand 41 is moved along the plurality of the optical heads 32a to 32g and the aperture AP is delivered by making the hand 41 move closer to and separate from the aperture unit that is moved toward the -Y direction, thereby automatically and efficiently exchanging the aperture AP and preventing the contamination of the aperture AP. <P>COPYRIGHT: (C)2008,JPO&INPIT |
