| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern drawing device capable of decreasing irregularity occurring in the seam of scanning regions. <P>SOLUTION: The pattern drawing device draws a pattern by exposure scanning in a plurality of times in a main scanning direction. The width h where an exposure head is relatively moved in a sub-scanning direction with respect to a substrate 9 between a preceding scanning exposure and a succeeding scanning exposure is shorter than the width w of one scanning region As in the sub-scanning direction. Thereby, scanning regions As partially overlap in the preceding exposure scanning and the succeeding exposure scanning. Consequently, an overlap region B1 is formed in the seam between adjacent scanning regions As, where exposure scanning is carried out twice by the preceding exposure scanning and the following exposure scanning. Since the influences of non-uniformity characteristics at both ends of the exposure head are mixed and averaged in the overlap region B1, irregularity occurring in the seam of scanning regions As can be decreased. <P>COPYRIGHT: (C)2008,JPO&INPIT |
