ULTRAVIOLET-RAY-ASSISTED PROCESSING APPARATUS FOR SEMICONDUCTOR PROCESS

摘要

An ultraviolet-ray-assisted processing apparatus ( 10 ) for a semiconductor process includes a window disposed in a wall defining the process chamber ( 12 ) and to face a worktable ( 11 ), and configured to transmit ultraviolet rays. A light source ( 15 ) is disposed outside the process chamber ( 12 ) to face the window ( 20 ), and configured to emit ultraviolet rays. A supply system configured to supply a process gas in the process chamber ( 12 ) includes a head space ( 21 ) formed in the window ( 20 ) and which the process gas passes through, and a plurality of discharge holes ( 22 ) for discharging the process gas.