VACUUM DEPOSITION APPARATUS

摘要

A vacuum deposition apparatus is provided to clean easily an anti-sticking plate by performing only a simple process for removing an outermost film of films of the anti-sticking plate. An evaporation source includes a melting pot and a heating unit. The melting pot is positioned in an inside of a vacuum chamber in order to receive organic materials. The heating unit is installed at the outside of the melting pot. A substrate supporting plate is installed at a position corresponding to the evaporation source. An anti-sticking plate(270) is positioned at an inner wall of the vacuum chamber. A film(280A) is attached on a surface of the anti-sticking plate. The film has a multilayered structure. The film includes polyethylene and PVC.