发明名称 Projection optical system, exposure apparatus and device fabricating method
摘要 There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system includes six reflective surfaces that includes, in order of reflecting light from the object surface, a first reflective surface, a second convex reflective surface, a third convex reflective surface, a fourth reflective surface, a fifth reflective surface and a sixth reflective surface, and an aperture stop along an optical path between the first and second reflective surfaces.
申请公布号 US7382437(B2) 申请公布日期 2008.06.03
申请号 US20040933070 申请日期 2004.09.02
申请人 CANON KABUSHIKI KAISHA 发明人 SASAKI TAKAHIRO
分类号 G03B27/54;H01L21/027;G02B17/06;G03B27/42;G03F7/20 主分类号 G03B27/54
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