发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX THEREOF
摘要 <p>A photosensitive resin composition, and a black matrix for a liquid crystal display device containing the composition are provided to reduce light transmissivity and to increase optical density after the development of pattern, to obtain a suitable adhesion and to improve the storage stability of the formulated solution. A photosensitive resin composition comprises a binder resin; a photopolymerization initiator; a black pigment; a solvent; and 0.5-10 wt% of an inorganic material which has a high refractive index of 1.5 or more. Preferably the inorganic material is at least one selected from TiO2 sol, SrTiO3 sol, ZnS, ZnSe, potassium bromide, AgCl, MgO, cesium iodide, cesium bromide, CaCO3, phosphorus tribromide, phenyl trichloride, thiochroman-4-one, thionyl chloride, ZnO2, CeO2, ITO sol, Ta2O5, Ti2O5, Ti2O3, ZrO2, Br2, CS2, ZrO2-TiO2 sol and SiO2-Fe2O3-based compound.</p>
申请公布号 KR20080048579(A) 申请公布日期 2008.06.03
申请号 KR20060118712 申请日期 2006.11.29
申请人 KOLON INDUSTRIES, INC. 发明人 YOON, JONG KUK;AHN, KYUNG WON;YOON, KYOUNG KEUN;PARK, JONG MIN
分类号 G03F7/004 主分类号 G03F7/004
代理机构 代理人
主权项
地址