| 摘要 |
Disclosed is a high-density, low-resistance sputtering target which has a low indium content. Also disclosed are a transparent conductive film and a transparent electrode for touch panels, which are produced by using such a sputtering target. Specifically disclosed is a sputtering target mainly containing indium, tin and zinc. This sputtering target has an atomic ratio In/(In + Sn + Zn) of 0.10-0.35, an atomic ratio Sn/(In + Sn + Zn) of 0.15-0.35, and an atomic ratio Zn/(In + Sn + Zn) of 0.50-0.70, and is composed of a sintered body of an oxide containing a hexagonal layered compound expressed as In2O3(ZnO)m (wherein m is an integer of 3-9) and a spinel structure compound expressed as Zn2SnO4. |
