| 摘要 |
An apparatus for trapping reaction residues of semiconductor is provided to more smoothly maintain the flow of air containing reaction residues by preventing a blocking phenomenon of a lattice. An apparatus for trapping reaction residues of semiconductor includes a hollow trap housing(112), a plurality of trap plates(120), and a heater(124). The trap plates are horizontally disposed in parallel to each other inside the trap housing. The heater passes through the trap plates and is vertically disposed in the trap housing to heat the trap plates. At least one plate-like mesh structure is disposed between the trap plates. At least one communication hole is formed in the mesh structure.
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