摘要 |
A developer regulating member abutting against a developer carrying member carrying a mono-component developer to regulate the layer thickness of the developer on the developer carrying member has a supported portion supported by a support member, and an abutting portion abutting against the developer carrying member, the surface roughness parameters of this abutting portion satisfying the following expressions (1) to (5): 0.30 <= Sm <= 0.170 (1) Rpk <= 2.0 (2) Rp <= 5.0 (3) 0.10 <= Rvk x (100-Mr2)/100 <= 1.30 (4) Rpk < Rvk (5), where Sm is a mean spacing [mm] of profile irregularities prescribed by JIS-B0601-1994, Rp is a maximum profile peak height [micrometer] prescribed by ISO4287-1997, Rpk is an initial wear height [mum] prescribed by DIN4776, Rvk is an oil retaining depth [mum] prescribed by DIN4776, and Mr2 is a profile bearing length ratio 2 [%] prescribed by DIN4776.
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