METHOD OF EXPOSING TO CHARGED PARTICLE BEAM AND DEVICE FOR EXPOSURE APPLYING ITS METHOD

摘要

PROBLEM TO BE SOLVED: To provide a variable-speed scan exposure method capable of attaining an exposure in a minimum exposure time while avoiding a faulty exposure. SOLUTION: The method of exposing to a charged particle beam includes irradiating a workpiece with a charged particle beam while moving the workpiece to expose an area of an exposure pattern, the method including: a step of generating speed data 56 having a speed distribution in a direction of motion of the workpiece, in which the speed data 56 are generated in accordance with secondary data 54 that are generated from pattern data 53 having at least data regarding the exposure pattern and data regarding exposure positions to have at least "dense/sparse" information on the exposure pattern; and a step of, while moving the workpiece at a variable speed according to the speed data 56 obtained by the preceding step, applying the charged particle beam onto the workpiece according to the pattern data 53. COPYRIGHT: (C)2008,JPO&INPIT