发明名称 Semiconductor Devices Having Low Threading Dislocations and Improved Light Extraction and Methods of Making the Same
摘要 Semiconductor device structures are provided that are suitable for use in the fabrication of electronic devices such as light emitting diodes. The semiconductor device structures include a substrate having a roughened growth surface suitable for supporting the growth of an epitaxial region thereon. The device structure can include an epitaxial region having reduced defects and/or improved radiation extraction efficiency on the roughened growth surface of the substrate. The roughened growth surface of the substrate can have an average roughness R<SUB>a </SUB>of at least about 1 nanometer (nm) and an average peak to valley height R<SUB>z </SUB>of at least about 10 nanometers (nm).
申请公布号 US2008121910(A1) 申请公布日期 2008.05.29
申请号 US20060563712 申请日期 2006.11.28
申请人 BERGMANN MICHAEL JOHN;HANSEN JASON;EMERSON DAVID TODD;HABERERN KEVIN WARD 发明人 BERGMANN MICHAEL JOHN;HANSEN JASON;EMERSON DAVID TODD;HABERERN KEVIN WARD
分类号 H01L21/20;H01L29/06;H01L33/00 主分类号 H01L21/20
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