发明名称 |
Semiconductor Devices Having Low Threading Dislocations and Improved Light Extraction and Methods of Making the Same |
摘要 |
Semiconductor device structures are provided that are suitable for use in the fabrication of electronic devices such as light emitting diodes. The semiconductor device structures include a substrate having a roughened growth surface suitable for supporting the growth of an epitaxial region thereon. The device structure can include an epitaxial region having reduced defects and/or improved radiation extraction efficiency on the roughened growth surface of the substrate. The roughened growth surface of the substrate can have an average roughness R<SUB>a </SUB>of at least about 1 nanometer (nm) and an average peak to valley height R<SUB>z </SUB>of at least about 10 nanometers (nm).
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申请公布号 |
US2008121910(A1) |
申请公布日期 |
2008.05.29 |
申请号 |
US20060563712 |
申请日期 |
2006.11.28 |
申请人 |
BERGMANN MICHAEL JOHN;HANSEN JASON;EMERSON DAVID TODD;HABERERN KEVIN WARD |
发明人 |
BERGMANN MICHAEL JOHN;HANSEN JASON;EMERSON DAVID TODD;HABERERN KEVIN WARD |
分类号 |
H01L21/20;H01L29/06;H01L33/00 |
主分类号 |
H01L21/20 |
代理机构 |
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