发明名称 IMPROVED ELECTROLESS COPPER COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide an electroless copper plating composition which is free from formaldehyde harmful as a reducing agent and is environmentally friendly, and also provides uniform copper deposits. SOLUTION: The electroless copper plating composition comprises: one or more sources of copper ions; one or more chelating agents chosen from hydantoin and hydantoin derivatives; and one or more reducing agents chosen from fructose and fructose esters. Also, disclosed is an electroless copper plating method for a printed circuit board including a plurality of through-holes using the copper electroless plating composition. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008121106(A) 申请公布日期 2008.05.29
申请号 JP20070178591 申请日期 2007.07.06
申请人 ROHM & HAAS ELECTRONIC MATERIALS LLC 发明人 POOLE MARK A;COBLEY ANDREW J;SINGH AMRIK;HIRST DEBORAH V
分类号 C23C18/40;H05K3/18;H05K3/42 主分类号 C23C18/40
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