发明名称 |
IMPROVED ELECTROLESS COPPER COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide an electroless copper plating composition which is free from formaldehyde harmful as a reducing agent and is environmentally friendly, and also provides uniform copper deposits. SOLUTION: The electroless copper plating composition comprises: one or more sources of copper ions; one or more chelating agents chosen from hydantoin and hydantoin derivatives; and one or more reducing agents chosen from fructose and fructose esters. Also, disclosed is an electroless copper plating method for a printed circuit board including a plurality of through-holes using the copper electroless plating composition. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008121106(A) |
申请公布日期 |
2008.05.29 |
申请号 |
JP20070178591 |
申请日期 |
2007.07.06 |
申请人 |
ROHM & HAAS ELECTRONIC MATERIALS LLC |
发明人 |
POOLE MARK A;COBLEY ANDREW J;SINGH AMRIK;HIRST DEBORAH V |
分类号 |
C23C18/40;H05K3/18;H05K3/42 |
主分类号 |
C23C18/40 |
代理机构 |
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地址 |
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