ILLUMINATION LENS SYSTEM FOR PROJECTION MICROLITHOGRAPHY, AND MEASURING AND MONITORING METHOD FOR SUCH AN ILLUMINATION LENS SYSTEM

摘要

Disclosed is a microlithographic projection exposure system (1) comprising an illumination system (4) with an illumination lens system (5) for illuminating an illumination field on a reticle level (6). The illumination lens system is equipped with a light distribution device (12a) encompassing a light deflection array (12) made up of individual elements, and an optical subassembly (21, 23 to 26) which converts the light intensity distribution predefined on a first level (19) of the illumination lens system (5) into an illumination angle distribution on the reticle level (6). Extracted illumination light (31) is applied to a spatially and time-resolved detection device (30) downstream of an extraction device (17) located between the light deflection array (12) and the reticle plane (6) within the light path in such a way that the detection device (30) detects a light intensity distribution corresponding to the light intensity distribution on the first level (19). The detection device (30) allows the influence of individual elements or groups of individual elements on the light intensity distribution on the first level (19) to be determined, especially by varying said individual elements or groups thereof over time. The light deflection array of the disclosed illumination lens system functions during normal operation.