发明名称 |
AI-NI-LA SYSTEM AI-BASED ALLOY SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME |
摘要 |
The invention relates to an Al-Ni-La system Al-based alloy sputtering target comprising Ni and La, wherein, when a section from (¼)t to (¾)t (t: thickness) in a cross section vertical to a plane of the sputtering target is observed with a scanning electron microscope at a magnification of 2000 times, (1) a total area of an Al-Ni system intermetallic compound having an average particle diameter of 0.3 mum to 3 mum with respect to a total area of the entire Al-Ni system intermetallic compound is 70% or more in terms of an area fraction, the Al-Ni system intermetallic compound being mainly composed of Al and Ni; and (2) a total area of an Al-La system intermetallic compound having an average particle diameter of 0.2 mum to 2 mum with respect to a total area of the entire Al-La system intermetallic compound is 70% or more in terms of an area fraction, the Al-La system intermetallic compound being mainly composed of Al and La.
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申请公布号 |
US2008121522(A1) |
申请公布日期 |
2008.05.29 |
申请号 |
US20070931197 |
申请日期 |
2007.10.31 |
申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.);KOBELCO RESEARCH INSTITUTE, INC. |
发明人 |
EHIRA MASAYA;TAKAGI KATSUTOSHI;KUGIMIYA TOSHIHIRO;YONEDA YOICHIRO;GOTOU HIROSHI |
分类号 |
C23C14/50;B05D3/00 |
主分类号 |
C23C14/50 |
代理机构 |
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代理人 |
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