| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of fabricating a TFT array substrate, wherein transmissive common lines are fabricated with less mask processes to simplify the fabricating process and further to reduce fabricating cost. <P>SOLUTION: A thin film transistor array substrate and a fabricating method thereof are disclosed. First, a substrate is provided. Next, a patterned first metal layer is formed to form a plurality of scan lines and a plurality of gates. Thereafter, a gate insulation layer is formed over the substrate. Moreover, a patterned semiconductor layer is formed to form a channel layer above the gates. The semiconductor layer is patterned with the same mask as that for patterning the transparent conductive layer. Additionally, a patterned second metal layer is formed to form a plurality of data lines, a plurality of sources, and a plurality of drains. After that, a dielectric layer is formed on the substrate. Finally, pixel electrodes are formed on the dielectric layer. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
