| 发明名称 |
APC SYSTEM AND MULTIVARIATE MONITORING METHOD FOR PLASMA PROCESS MACHINE |
| 摘要 |
An advance process control (APC) system for a plasma process machine is provided, which includes at least an optical emission spectroscopy (OES) system and an APC analysis apparatus. The OES system is used for monitoring a testing object in the plasma process machine. The APC analysis apparatus is used for analyzing the data received from the OES system.
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| 申请公布号 |
US2008123082(A1) |
申请公布日期 |
2008.05.29 |
| 申请号 |
US20070737541 |
申请日期 |
2007.04.19 |
| 申请人 |
MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
LUOH TUUNG;LUO SHING-ANN;SU CHIN-TA;YANG TA-HUNG;CHEN KUANG-CHAO |
| 分类号 |
G01N21/00 |
主分类号 |
G01N21/00 |
| 代理机构 |
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