发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and beam of radiation, and is an off-axis alignment sensor.
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申请公布号 |
US7379153(B2) |
申请公布日期 |
2008.05.27 |
申请号 |
US20030356727 |
申请日期 |
2003.02.03 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
GIJSBERTSEN JOHANNES GERARDUS;DE JAGER PIETER WILLEM HORMAN;NIJKERK MICHIEL DAVID |
分类号 |
G03B27/00;G03F7/20;G01J1/00;G03F9/00;H01L21/027 |
主分类号 |
G03B27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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